SEM SCANNING ELECTRON MICROSCOPE SERVICES - Hitachi S-4800 Scanning Electron Microscopy (SEM) Imaging and EDX Spectroscopy Materials Analysis Services S-4700, S4500 - services on HTE Labs Wafer Fab SEM SCANNING ELECTRON MICROSCOPE SERVICES - Hitachi S-4800 Scanning Electron Microscopy (SEM) Imaging and EDX Spectroscopy Materials Analysis Services S-4700, S4500 - services on HTE Labs Wafer Fab - Research and Development Laboratories for semiconductor optoelectonics sensors microwave thin film active and passive components SEM, SCANNING ELECTRON MICROSCOPE, Hitachi S-4800,Imaging, EDX, Spectroscopy,Materials Analysis Services, S-4700, S4500, Research and Development Laboratories, semiconductor, optoelectonics, sensors, microwave, thin film, active components, passive components,high resolution imaging, Aerospace, Automotive, Biomedical, Biotechnology, Compound Semiconductor, Data Storage, Defense, Thin Film Displays, Thin Film Circuits, Industrial Electronic Products, Lighting, Pharmaceutical, Photonics, Optoelectronics, Polymer Science, Semiconductors, Solar Photovoltaic, Telecommunications Scanning Electron Microscopes (SEM) are capable of imaging structures and materials with very high resolutions and extreme depth of field. HTE Labs offers Scanning Electron Microscopy SEM services for following semiconductor related applications: Aerospace, Automotive, Biomedical, Biotechnology, Compound Semiconductor, Data Storage, Defense, Thin Film Displays, Thin Film Circuits, Industrial Electronic Products, Lighting, Pharmaceutical, Photonics and Optoelectronics, Polymer Science, Semiconductors, Solar Photovoltaic, Telecommunications, etc. HTE Labs employs Hitachi S-4800, Hitachi S4700 or Hitachi S4500 Scanning Electron Microscopes. Here are some of the most important advantages of the Hitachi S-4800 as specified by manufacturer: 1.4nm resolution at 1kV with Beam Deceleration Technology minimal specimen damage 1.0nm Resolution at 15kV 200mm specimen diameter. This allows HTE Labs to provide Scanning Electron Microscopy SEM imaging services on whole wafers with sizes 1in, 2in, 3in, 4in, 5in, 6in, 8in [25mm, 50mm, 75mm, 100mm, 125mm, 150mm, 200mm]. Scanning Electron Microscopy SEM services offered by HTE Labs include: SEM surface topography of metals, dielectrics, photo resist and other polymers on customer prepared, supplied specimens [cross sections, individual devices or whole wafers] Thickness measurements and deposition rates calibration of deposited thin film layers by Scanning Electron Microscopy Structure studies of thin films in nanometer range Crystallographic information for sub-micron specimen Measurements of narrow lateral dimensions Failure analysis, dimensional analysis, process characterization, etc. SCANNING ELECTRON MICROSCOPE - SEM SERVICES - BEAM TIME SCANNING ELECTRON MICROSCOPE - SEM - SAMPLES PREPARATION HTE Labs provides process specialties wafer foundry, thin film vacuum deposition services, applied thin film processing for analog and mixed signal bipolar manufacturing processes, Analog CMOS wafer foundry, R&D support, research and development support for microelectronics and process specialties wafer Fab processing to customers from semiconductors and microelectronics industry. Bipolar wafer foundry includes the following processes: 20V bipolar process,45V bipolar process,75V bipolar process,25V super-beta bipolar process and high voltage dielectric isolated bipolar processes. R&D support is provided in the following fields of microelectronics: test and measurement, medical instrumentation, industrial process control and communications, thin film active and passive components technologies, flip chip technology (TiW/Cu/Cu/SnPb), MEMS technology, smart sensor technologies (inertial, pressure, temperature, gas and smoke detectors), optoelectronic technologies and components, discrete and integrated circuits technology development for special applications, LiNbO3 applications including SAW, Ti diffusion, light wave guides and Mach-Zender light modulators. Specialty wafer Fab processing: epi deposition, epitaxy, SiGe, epi, diffusion and oxidation, ion implant, LPCVD nitride, PECVD nitride Si3N4, SiO2, platinum silicidation, photo-lithography, plasma etching, silicon micro-machining with KOH anisotropic etch, backside sputter depositions of Ti/Ni/Ag, gold deposition, gold alloy, lift off processes, Ti/Pt/Au lift off process, sputter depositions of thin film resistors : SiCr, NiCr, TaN2, silicon wafers back grind and polish followed by tri-metal backside sputter depositions, gold backside sputter depositions and alloy : gold electroplating and gold bump, wafer probing, dicing services, wafer saw, package development, solid via packages, packaging and test services, failure analysis services, SEM, scanning electron microscopy, ellipsometer measurements, four point probe measurements.
 
 
SCANNING ELECTRON MICROSCOPE - SEM SERVICES - BEAM TIME
 
 

PROPERTIES / FEATURES   APPLICATIONS
1.4nm resolution at 1kV with Beam Deceleration Technology
Minimal specimen damage
1.0nm Resolution at 15kV
200mm specimen diameter
 
SEM surface topography of metals, dielectrics, photo resist and other polymers on customer prepared, supplied specimens
Thickness measurements and deposition rates calibration of deposited thin film layers
Structure studies of thin films in nanometer range
Crystallographic information for sub-micron specimen
Measurements of narrow lateral dimensions
Failure analysis, dimensional analysis, process characterization

SHORT PROCESS DESCRIPTION
Scanning Electron Microscopes (SEM) are capable of imaging structures and materials with very high resolutions and extreme depth of field.

HTE Labs offers Scanning Electron Microscopy SEM services for following semiconductor related applications: Aerospace, Automotive, Biomedical, Biotechnology, Compound Semiconductor, Data Storage, Defense, Thin Film Displays, Thin Film Circuits, Industrial Electronic Products, Lighting, Pharmaceutical, Photonics and Optoelectronics, Polymer Science, Semiconductors, Solar Photovoltaic, Telecommunications, etc.

HTE Labs employs Hitachi S-4800, Hitachi S4700 or Hitachi S4500 Scanning Electron Microscopes. Here are some of the most important advantages of the Hitachi S-4800 as specified by manufacturer:
  • 1.4nm resolution at 1kV with Beam Deceleration Technology
  • Minimal specimen damage
  • 1.0nm Resolution at 15kV
  • 200mm specimen diameter. This allows HTE Labs to provide Scanning Electron Microscopy SEM imaging services on whole wafers with sizes 1in, 2in, 3in, 4in, 5in, 6in, 8in [25mm, 50mm, 75mm, 100mm, 125mm, 150mm, 200mm].

Scanning Electron Microscopy SEM services offered by HTE Labs include:
  • SEM surface topography of metals, dielectrics, photo resist and other polymers on customer prepared, supplied specimens [cross sections, individual devices or whole wafers]
  • Thickness measurements and deposition rates calibration of deposited thin film layers by Scanning Electron Microscopy
  • Structure studies of thin films in nanometer range
  • Crystallographic information for sub-micron specimen
  • Measurements of narrow lateral dimensions
  • Failure analysis, dimensional analysis, process characterization, etc.

WAFER FOUNDRY - R&D SEMICONDUCTOR PROCESS DEVELOPMENT
HTE LABS is helping customers to solve R&D problems, capacity problems, lower cost as well as develop a back-up process for existing in-house operations. Any company currently involved or contemplating R&D related to semiconductor devices or thin film technologies, is encouraged to consider using HTE LABS expertise and capabilities. To contact HTE LABS and discuss an application in the strictest confidentiality, navigate to CONTACT PAGE.

PROCESS ORDERING INFORMATION

SAMPLE ID NO. OF LOCATIONS MAGNIFICATION PER LOCATION GENERATE PROCESS NAME/TIME BEAM TIME
[hours]
L1 L2 L3 N1 N2 N3

SAMPLE ID: Please enter max 3 letters and 3 numbers.
NR. OF LOCATIONS: Please enter number of sites on the sample to be inspected.
MAGNIFICATIONS: Please enter number of magnifications for inspection; When sending samples, please provide drawings, pictures and list of magnifications for each sample.
CLICK BUTTON to Build PROCESS CODE for your Samples. Total cost will be displayed.

STANDARD PROCESS PRICE LIST

PROCESS CODE NO. OF LOCATIONS NO. OF MAGNIFICATIONS TIME [hours] TOTAL COST [$] LEAD TIME [DAYS ARO]
 
Minimum batch for SEM is 1 sample. Unit price does not include SAMPLE PREPARATION or RUSH charges. For cost of SEM SAMPLE PREPARATION please go to SEM-SAMPLE page.
 
Please enter your e-mail address and click SUBMIT to receive a copy of this quote.

INSTANT QUOTE
PROCESS CODE QTY EMAIL  

ORDERING: Registered customers can order online from within assigned BUSINESS PORTAL. A copy of the order along with an order confirmation receipt is issued instantly for all orders placed on line. On line Orders have to be verified, accepted and acknowledged by HTE LABS sales department in writing before, becoming non cancelable binding contracts.
DELIVERY: Typical delivery for Standard processes is 2-4 working days ARO. For Custom processes lead-time may vary. HTE Labs may supply on request substrate materials from its own inventory or from third party supplier.
SHIPPING & PACKING: For certain processes, customer should ship only prime wafers, delivered in sealed containers [original manufacturer seal must be present]. All wafers shipped to HTE LABS by customers, should be packed in suitable wafer carriers or wafer containers, wrapped in reusable minim 2 layers of air bubble packing material [pink anti-static bubble cushioning wrap], or air pillows and heavy wall cardboard boxes. Foam packing peanuts are not acceptable due to the nuisance caused by particles and electrostatic charge generated during shipping.
SAMPLES: Due to the nature of this product line, free samples are not available, unless they are against an existing firm order, pending qualification of a process.
HTE LABS guarantees continuous supply and availability of any of it's standard or custom developed processes and technologies provided minimum order quantities are met.
HTE LABS has made every effort to have this information as accurate as possible. However, no responsibility is assumed by HTE LABS for its use, nor for any infringements of rights of third parties, which may result from its use. HTE LABS reserves the right to revise the content or modify its product line without prior notice. HTE LABS processes and technologies are not authorized for and should not be used within support systems which are intended for surgical implants into the body, to support or sustain life, in aircraft, space equipment, submarine, or nuclear facility applications without HTE LABS specific written consent.

Home> SEM SCANNING ELECTRON MICROSCOPE SERVICES> Last updated: July 06, 2009

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