The technologies developed are generally compatible with the processes of major wafer foundry suppliers. A major difference exist however in the use of GOLD and COPPER Interconnections instead of Aluminum. A proprietary Thin Film Resistors (TFR) process has been developed for all technologies providing stable, low TCR, laser trimmable resistors that provides linear circuit designers with an increased flexibility.
HTE Labs engineers work closely with customers to assure that well-defined design rules tailored to our technologies are followed and that silicon processing procedures are well understood. Upon completion of a custom developed technology, HTE Labs provides customers with a set of SPICE parameters and layout design rules and a library of standard devices.
The following is a listing of available processes as well as processes currently in development:
BIPOLAR 20V, 500MHz + Thin Film Resistors |
Completed
|
BIPOLAR 20V, 3.5G Complimentary + Thin Film Resistors |
Development
|
BIPOLAR 25V, 200 MHz Super Beta (HFE>000) |
Completed
|
BIPOLAR 45V 200 MHz + Thin Film Resistors |
Completed
|
BIPOLAR 75V, 200 MHz HFE = 250 |
Completed
|
BICMOS: Double Layer Refractory Silicide15V – 25V, 7.5G NPN Complimentary + Thin Film Resistors |
Development
|
CMOS: Double Layer Refractory Silicide, Double metal + Thin Film Resistors |
Development
|
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